Application Deadline: February 2, 2009
To submit your application, go to: http://www.nwp.org/cs/public/print/events/374
Retreat participants will be guided through the process of shaping a piece of work into one or more publishable forms that may include, but are not limited to, bibliographies, articles, presentations, demonstrations, online resources, and how-to manuals. It is our hope that by the end of the retreat each participant or team will submit a draft that, with the support of the TLN Resource Development Leadership team, can be disseminated in a variety of venues.
We encourage participants to attend the retreat in teams of two, to develop a resource about any successful writing project work with a technology focus. We are especially interested in work that helps us to fulfill the mission of the TLN and accomplish the goals of supporting sites' plans for the use of technology in their ongoing work and by helping to develop an understanding of how technology impacts the teaching and learning of writing. We are looking to resources that will
Your complete application should consist of the following:
Participation in TLN's Resource Development Retreat is by online application only. In order to submit your application, type your answers in a word processing program and save the document. Once you begin the application submission process, you may either copy and paste the text manually into the provided text box or upload the document as an attachment to your application.
This application requires a brief letter of support from the director of your site (due February 13, 2009), indicating support for you as you prepare to document your site's work through the development of this new resource. Please ask your site director to respond to the email inquiry he or she will receive after you have submitted your Resource Development Retreat application online. Your application will not be complete until we receive your letter of support.
Participation in this retreat is by application only. The group of participants chosen will be as representative as possible of the geographic, racial, and ethnic diversity of the Technology Liaisons Network. Sites are strongly encouraged to send a team of two teacher-consultants to develop a resource about a successful site practice. The Resource Development Retreat is limited to 20 participants.
Submit completed applications no later than February 2, 2009. All applicants will be contacted regarding their applications by March 20, 2009.